Plasma etching: fundamentals and applications
Auteur :
Sugawara, M.
Éditeur :
Oxford University Press
ISBN :
9780198562870
Date de publication :
28 mai 1998
Dimensions :
24,2 x 16,3 x 2,3 cm
Poids :
743 g
Langue :
Anglais
Pays d'origine :
Grande Bretagne
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.