Plasma processes for semiconductor fabrication
Auteur :
Hitchon, W. N. G.
Éditeur :
Cambridge University Press
ISBN :
9780521591751
Date de publication :
28 janv. 1999
Dimensions :
25,9 x 18,0 x 1,8 cm
Poids :
620 g
Langue :
Anglais
Pays d'origine :
Grande Bretagne
Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.