Photomask technology and management: 18th: annual bacus symposium
Auteur :
Grenon, Brian J.
ISBN :
9780819430076
Date de publication :
31 mai 1999
Dimensions :
23,0 cm
Langue :
Anglais
Pays d'origine :
USA
This work brings together 68 papers from the 18th Bacus symposium on photomask technology and management. It covers photomask patterning, defects, inspection, repair, mask metrology and advanced mask metrology.