Microlithography fundamentals in semiconductor devices and fabrication technology
Auteur :
Nonogaki, Saburo / Takumi, Ueno / Ito, Toshio
Éditeur :
Taylor & Francis Inc
ISBN :
9780824799519
Date de publication :
25 juin 1998
Dimensions :
22,9 x 15,2 cm
Poids :
780 g
Langue :
Anglais
Pays d'origine :
USA
Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."