Atomic layer deposition: principles, characteristics, and nanotechnology applications
Auteur :
Kääriäinen, Tommi / Cameron, David / Kääriäinen, Marja-Leena / Sherman, Arthur
Éditeur :
John Wiley & Sons Inc
ISBN :
9781118062777
Date de publication :
28 juin 2013
Dimensions :
24,1 x 16,1 x 2,1 cm
Poids :
567 g
Langue :
Anglais
Pays d'origine :
USA
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.