Plasma charging damage
Auteur :
Cheung, Kin P.
Éditeur :
Springer London Ltd
ISBN :
9781447110620
Date de publication :
30 août 2012
Dimensions :
23,5 x 15,5 cm
Langue :
Anglais
Pays d'origine :
Grande Bretagne
In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps.