Chemical-mechanical polishing – fundamentals and challenges: volume 566
Éditeur :
Materials Research Society
ISBN :
9781558994737
Date de publication :
10 févr. 2000
Dimensions :
23,4 x 15,7 x 2,3 cm
Poids :
591 g
Langue :
Anglais
Pays d'origine :
USA
This book brings together many of the active players in the field to focus on the interdisciplinary nature of these challenges. It reflects, to some extent, the role played by both academic institutions and multinational corporations in opening up the frontiers in the field of CMP for wider dissemination. Both experimental and theoretical contributions are included.