Nanoimprint lithography: principles, processes & materials
Auteur :
Lan, Hongbo / Ding, Yucheng / Liu, Hongzhong
Éditeur :
Nova Science Publishers Inc
ISBN :
9781611225013
Date de publication :
23 août 2011
Dimensions :
15,5 x 23,0 cm
Poids :
148 g
Langue :
Anglais
Pays d'origine :
USA
Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). This book gives fresh insight to NIL, one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures.