Silicon technologies: ion implantation and thermal treatment
Éditeur :
ISTE Ltd and John Wiley & Sons Inc
ISBN :
9781848212312
Date de publication :
10 juin 2011
Dimensions :
24,1 x 16,3 x 2,6 cm
Poids :
671 g
Langue :
Anglais
Pays d'origine :
Grande Bretagne
* Specifically in the field of microelectronics, the self-fulfilling power of Moore s Law has driven an amazing pace of technological advances * This book explains the fundamental physical and chemical rules in major front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion .