Reactive sputter deposition
Éditeur :
Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
ISBN :
9783540766629
Date de publication :
24 avr. 2008
Dimensions :
23,5 x 15,5 cm
Langue :
Anglais
Pays d'origine :
Allemagne
In the family of Physical Vapour Deposition techniques, sputtering is one of the most important. This book describes various aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth allowing the reader to understand the complete process.