Electromigration in ulsi interconnections
Auteur :
Tan, Cher Ming
Éditeur :
World Scientific Publishing Co Pte Ltd
ISBN :
9789814273329
Date de publication :
25 août 2010
Langue :
Anglais
Pays d'origine :
Singapour
Presents a description of the electro migration in integrated circuits. This book examines the various interconnected systems and their evolution employed in integrated circuit technology. It is suitable for readers on electro migration in ULSI interconnections.