Photomask fabrication technology
Auteur :
Eynon, Benjamin / Wu, Banqiu / Wu, Banqiu
Éditeur :
McGraw-Hill Education - Europe
ISBN :
9780071445634
Date de publication :
16 août 2005
Dimensions :
23,1 x 15,2 x 4,5 cm
Poids :
917 g
Langue :
Anglais
Pays d'origine :
USA
Describes the science and technology of industrial photomask production, including fundamental principles, industrial production flows, and technological evolution and development. This book focuses on industrial applications rather than pure science. It is suitable for engineers developing microelectronic manufacturing processes.