Sub-half-micron lithography for ulsis
Éditeur :
Cambridge University Press
ISBN :
9780521022347
Date de publication :
10 nov. 2005
Dimensions :
24,5 x 17,9 x 1,8 cm
Poids :
616 g
Format :
Trade paperback (US)
Langue :
Anglais
Pays d'origine :
Grande Bretagne
This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. Several important lithography methods, such as deep UV, X-ray, electron-beam, and focused ion-beam lithography are described in detail by experts. The principles underlying each of the techniques are illustrated at the beginning of each chapter.