Tribology in chemical-mechanical planarization
Auteur :
Liang, Hong / Craven, David
Éditeur :
Taylor & Francis Inc
ISBN :
9780824725679
Date de publication :
1 mars 2005
Dimensions :
23,4 x 15,6 cm
Poids :
385 g
Langue :
Anglais
Pays d'origine :
USA
The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical planarization technology. This book offers an examination of tribological principles and their applications in CMP, including integrated circuits and basic concepts in surfaces of contacts.