Machine learning-based modelling in atomic layer deposition processes
Auteur :
Adeleke, Oluwatobi / Karimzadeh, Sina / Jen, Tien-Chien
Éditeur :
Taylor & Francis Ltd
ISBN :
9781032386737
Date de publication :
6 mai 2025
Dimensions :
23,4 x 15,6 cm
Poids :
700 g
Langue :
Anglais
Pays d'origine :
Grande Bretagne
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.