Atomic layer deposition for semiconductors
Éditeur :
Springer-Verlag New York Inc.
ISBN :
9781489979438
Date de publication :
23 août 2016
Dimensions :
23,5 x 15,5 cm
Langue :
Anglais
Pays d'origine :
USA
This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes.