Spacer engineered finfet architectures: high-performance digital circuit applications
Auteur :
Dasgupta, Sudeb / Kaushik, Brajesh Kumar / Pal, Pankaj Kumar
Éditeur :
Taylor & Francis Inc
ISBN :
9781498783590
Date de publication :
6 juin 2017
Dimensions :
23,4 x 15,6 cm
Poids :
378 g
Langue :
Anglais
Pays d'origine :
USA
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.