Optical and euv lithography: a modeling perspective
Auteur :
Erdmann, Andreas
Éditeur :
SPIE Press
ISBN :
9781510639010
Date de publication :
30 avr. 2021
Poids :
680 g
Langue :
Anglais
Pays d'origine :
USA
Introduces interested students with backgrounds in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology, and other areas to the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers expand their knowledge of alternative methods and applications.