High-k gate dielectric materials: applications with advanced metal oxide semiconductor field effect transistors (mosfets)
Éditeur :
Apple Academic Press Inc.
ISBN :
9781771888431
Date de publication :
18 déc. 2020
Dimensions :
22,9 x 15,2 cm
Poids :
650 g
Langue :
Anglais
Pays d'origine :
Canada
This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS).