New prospects of integrating low substrate temperatures with scaling-sustained device architectural innovation
Auteur :
Ashraf, Nabil Shovon / Alam, Shawon / Alam, Mohaiminul
Éditeur :
Springer International Publishing AG
ISBN :
9783031008993
Date de publication :
16 févr. 2016
Dimensions :
23,5 x 19,1 cm
Langue :
Anglais
Pays d'origine :
Suisse
In order to sustain Moore's Law-based device scaling, principal attention has focused on toward device architectural innovations for improved device performance as per ITRS projections for technology nodes up to 10 nm. Efficient integration of lower substrate temperatures (