Ion implantation and annealing applications, science and technology: contributions from iit school, edition 2024
Éditeur :
Springer Nature Switzerland AG
ISBN :
9783032100078
Date de publication :
30 mai 2026
Dimensions :
23,5 x 15,5 cm
Langue :
Anglais
Pays d'origine :
Suisse
It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology.